====== Clean Room Facilities ======

===== Overview =====

This facility is a controlled environment designed to maintain very low levels of particulates such as dust, airborne organisms, or vaporized particles.

The clean Room supports the processing of photolithography, microfluidics, micro-optic, and sensor devices as well as surface cleaning, bonding and etching throughout Oxygen plasma. Advanced processing capabilities include soft lithography techniques for patterning elastomeric materials.


===== Laboratory Floorplan =====
   * Clean Room [[https://www.eecs.yorku.ca/ee/BERGERON_LABS/MEDICAL_DEVICES/BRG_326_BIOMEDICAL_SHARED_LAB/BRG326_-_Clean_Room_-_Floorplan.pdf|Floor plan]]


===== Equipment =====

  * [[Direct Laser Lithography System]] - Direct Laser Lithography System

  * Zepto Plasma Surface Technology - Diener Electronic

  * WS-650 Series Spin Coater - Laurell Technologies Corporation

  * UV-KUB UV LED - Masking System