EE Teaching Labs - cleanroom https://wiki.eecs.yorku.ca/lab/teaching/ 2026-04-05T02:21:38+00:00 EE Teaching Labs https://wiki.eecs.yorku.ca/lab/teaching/ https://wiki.eecs.yorku.ca/lab/teaching/_media/wiki:dokuwiki-128.png text/html 2021-02-09T00:30:41+00:00 Anonymous (anonymous@undisclosed.example.com) Dilase 250 https://wiki.eecs.yorku.ca/lab/teaching/cleanroom:direct_laser_lithography_system?rev=1612830641&do=diff Dilase 250 ---------- Overview The Dilase 250 is a direct laser photolithography equipment, designed to materialize relief patterns in photoresist by a photopolymerization process induced by a UV laser beam. The software suite (Dilasesoft 250) is composed of four applications, which allow patterns design and creation (« KloeDesign »; « Dfl Creator »), and also to control the equipment and the automated writing of these patterns in a photosensitive material (« DilaseSoft 250 »; « Trajectory T… text/html 2021-02-09T00:15:10+00:00 Anonymous (anonymous@undisclosed.example.com) Clean Room Facilities https://wiki.eecs.yorku.ca/lab/teaching/cleanroom:start?rev=1612829710&do=diff Clean Room Facilities Overview This facility is a controlled environment designed to maintain very low levels of particulates such as dust, airborne organisms, or vaporized particles. The clean Room supports the processing of photolithography, microfluidics, micro-optic, and sensor devices as well as surface cleaning, bonding and etching throughout Oxygen plasma. Advanced processing capabilities include soft lithography techniques for patterning elastomeric materials.