Differences

This shows you the differences between two versions of the page.

--- cleanroom:start [2019/10/22 14:07] – giancarlo
+++ cleanroom:start [2021/02/09 00:15] (current) – giancarlo
@@ Line 1: / Line 1: @@
 ====== Clean Room Facilities ======
 ===== Overview =====
+This facility is a controlled environment designed to maintain very low levels of particulates such as dust, airborne organisms, or vaporized particles.
+The clean Room supports the processing of photolithography, microfluidics, micro-optic, and sensor devices as well as surface cleaning, bonding and etching throughout Oxygen plasma. Advanced processing capabilities include soft lithography techniques for patterning elastomeric materials.
 ===== Laboratory Floorplan =====
-   * Clean Room [[https://www.eecs.yorku.ca/ee/EECS_LABS_BERGERON/BRG 326 BIOMEDICAL SHARED LAB/BRG326 - Clean Room - Floorplan.pdf|Floor plan]]
+   * Clean Room [[https://www.eecs.yorku.ca/ee/BERGERON_LABS/MEDICAL_DEVICES/BRG_326_BIOMEDICAL_SHARED_LAB/BRG326_-_Clean_Room_-_Floorplan.pdf|Floor plan]]
 ===== Equipment =====
-**Dilase 250**
+  * [[Direct Laser Lithography System]] - Direct Laser Lithography System
-   * [[Direct Laser Lithography System]]
+  * Zepto Plasma Surface Technology - Diener Electronic
+  * WS-650 Series Spin Coater - Laurell Technologies Corporation
+  * UV-KUB UV LED - Masking System