cleanroom:direct_laser_lithography_system
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cleanroom:direct_laser_lithography_system [2019/11/04 19:27] – created giancarlo | cleanroom:direct_laser_lithography_system [2021/02/09 00:30] (current) – giancarlo | ||
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====== Dilase 250 ====== | ====== Dilase 250 ====== | ||
+ | |||
+ | ---- | ||
+ | |||
+ | ====== Overview ====== | ||
+ | |||
+ | The Dilase 250 is a direct laser photolithography equipment, designed to materialize | ||
+ | relief patterns in photoresist by a photopolymerization process induced by a UV laser | ||
+ | beam. | ||
+ | |||
+ | The software suite (Dilasesoft 250) is composed of four applications, | ||
+ | patterns design and creation (« KloeDesign »; « Dfl Creator »), and also to control the | ||
+ | equipment and the automated writing of these patterns in a photosensitive material | ||
+ | (« DilaseSoft 250 »; « Trajectory Tracking »). | ||
+ | Depending on configuration, | ||
+ | or 405nm depending on model) and ONE optical treatment line (2μm laser spot at | ||
+ | minimum). | ||
+ | |||
+ | {{: | ||
+ | |||
+ | |||
+ | ====== Documents ====== | ||
+ | * Training | ||
+ | * [[https:// | ||
+ | |||
+ | * Manuals | ||
+ | * [[https:// | ||
+ | * [[https:// | ||
+ | * [[https:// | ||
+ | |||
+ | * Tutorials | ||
+ | * [[https:// | ||
+ | * [[https:// | ||
+ | * [[https:// | ||
+ | * [[https:// | ||
+ | |||
+ | |||
+ | |||
+ | |||
cleanroom/direct_laser_lithography_system.1572895679.txt.gz · Last modified: by giancarlo