cleanroom:direct_laser_lithography_system
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| cleanroom:direct_laser_lithography_system [2019/11/04 19:27] – created giancarlo | cleanroom:direct_laser_lithography_system [2021/02/09 00:30] (current) – giancarlo | ||
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| ====== Dilase 250 ====== | ====== Dilase 250 ====== | ||
| + | |||
| + | ---- | ||
| + | |||
| + | ====== Overview ====== | ||
| + | |||
| + | The Dilase 250 is a direct laser photolithography equipment, designed to materialize | ||
| + | relief patterns in photoresist by a photopolymerization process induced by a UV laser | ||
| + | beam. | ||
| + | |||
| + | The software suite (Dilasesoft 250) is composed of four applications, | ||
| + | patterns design and creation (« KloeDesign »; « Dfl Creator »), and also to control the | ||
| + | equipment and the automated writing of these patterns in a photosensitive material | ||
| + | (« DilaseSoft 250 »; « Trajectory Tracking »). | ||
| + | Depending on configuration, | ||
| + | or 405nm depending on model) and ONE optical treatment line (2μm laser spot at | ||
| + | minimum). | ||
| + | |||
| + | {{: | ||
| + | |||
| + | |||
| + | ====== Documents ====== | ||
| + | * Training | ||
| + | * [[https:// | ||
| + | |||
| + | * Manuals | ||
| + | * [[https:// | ||
| + | * [[https:// | ||
| + | * [[https:// | ||
| + | |||
| + | * Tutorials | ||
| + | * [[https:// | ||
| + | * [[https:// | ||
| + | * [[https:// | ||
| + | * [[https:// | ||
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cleanroom/direct_laser_lithography_system.1572895679.txt.gz · Last modified: by giancarlo
