cleanroom:start
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Table of Contents
Clean Room Facilities
Overview
This facility is a controlled environment designed to maintain very low levels of particulates such as dust, airborne organisms, or vaporized particles.
The clean Room supports the processing of photolithography, microfluidics, micro-optic, and sensor devices as well as surface cleaning, bonding and etching throughout Oxygen plasma. Advanced processing capabilities include soft lithography techniques for patterning elastomeric materials.
Laboratory Floorplan
- Clean Room Floor plan
Equipment
- Dilase 250 - Direct Laser Lithography System
- Zepto Plasma Surface Technology - Diener Electronic
- WS-650 Series Spin Coater - Laurell Technologies Corporation
- UV-KUB UV LED - Masking System
cleanroom/start.1576851986.txt.gz · Last modified: 2019/12/20 14:26 by giancarlo